Transparent conductive coating for capacitive touch panel with additional functional film(s)

ABSTRACT

A multi-layer conductive coating is substantially transparent to visible light, contains at least one conductive layer comprising silver that is sandwiched between at least a pair of dielectric layers, and may be used as an electrode and/or conductive trace in a capacitive touch panel. The multi-layer conductive coating may contain a dielectric layer of or including zirconium oxide (e.g., ZrO 2 ) and/or silicon nitride, and may be used in applications such as capacitive touch panels for controlling showers, appliances, vending machines, electronics, electronic devices, and/or the like. The touch panel may further include a functional film(s) which may be one or more of: an index-matching film, an antiglare film, an anti-fingerprint film, and anti-microbial film, a scratch resistant film, and/or an antireflective (AR) film.

This application is a continuation-in-part (CIP) of U.S. Ser. No.15/647,541 filed Jul. 12, 2017, which is a continuation of U.S. Ser. No.15/215,908 filed Jul. 21, 2016 (U.S. Pat. No. 9,733,779), which is acontinuation-in-part (CIP) of U.S. Ser. No. 15/146,270 filed May 4,2016, which is a continuation of U.S. Ser. No. 13/685,871 filed Nov. 27,2012 (now U.S. Pat. No. 9,354,755), the disclosures of which are allhereby incorporated herein by reference. This application is also acontinuation-in-part (CIP) of U.S. Ser. No. 15/409,658 filed Jan. 19,2017, which is a continuation of U.S. Ser. No. 14/681,266 filed Apr. 8,2015 (now U.S. Pat. No. 9,557,871), the disclosures of which are allhereby incorporated herein by reference.

Example embodiments of this invention relate to a multi-layer conductivecoating that is substantially transparent to visible light, contains atleast one conductive layer comprising silver that is sandwiched betweenat least a pair of dielectric layers, and may be used as an electrodeand/or conductive trace in a capacitive touch panel. The multi-layerconductive coating may contain a layer of or including zirconium oxide(e.g., ZrO₂) and/or silicon nitride in certain embodiments, and may beused in applications such as capacitive touch panels for controllingshowers, appliances, vending machines, electronics, electronic devices,and/or the like. The layer of or including zirconium oxide may beprovided for improving durability in touch panel applications. Incertain example embodiments, the coating includes a silver layer(s) andmay be used as an electrode(s) in a capacitive touch panel so as toprovide for an electrode(s) transparent to visible light but withoutmuch visibility due to the more closely matching visible reflection ofthe coating on the substrate to that of an underlying substrate in areaswhere the coating is not present. The coating also has improvedconductivity (e.g., smaller sheet resistance R_(s) or smalleremissivity, given a similar thickness and/or cost of deposition)compared to typical ITO coatings used in touch panels. The touch panelmay further include a functional film(s) which may be one or more of: anindex-matching film, an antiglare film, an anti-fingerprint film, andanti-microbial film, a scratch resistant film, and/or an antireflective(AR) film. The functional film may be provided, for example, on eitherside of the glass substrate.

BACKGROUND

A capacitive touch panel often includes an insulator such as glass,coated with a conductive coating. As the human body is also anelectrical conductor, touching the surface of the panel results in adistortion of the panel's electrostatic field, measurable as a change incapacitance for example. A transparent touch panel may be combined witha display such as a liquid crystal display (LCD) panel to form atouchscreen. A projected capacitive (PROCAP) touch panel, which mayoptionally include an LCD or other display, allows finger or othertouches to be sensed through a protective layer(s) in front of theconductive coating.

FIGS. 1(a) to 1(g) illustrate an example of a related art projectedcapacitive touch panel, e.g., see U.S. Pat. No. 8,138,425 the disclosureof which is hereby incorporated herein by reference. Referring to FIG.1(a), substrate 11, x-axis conductor 12 for rows, insulator 13, y-axisconductor 14 for columns, and conductive traces 15 are provided.Substrate 11 may be a transparent material such as glass. X-axisconductors 12 and y-axis conductors 14 are typically indium tin oxide(ITO) which is a transparent conductor. Insulator 13 may be aninsulating material (for example, silicon nitride) which inhibitsconductivity between x-axis conductors 12 and y-axis conductors 14.Traces 15 provide electrical conductivity between the plurality ofconductors and a signal processor (not shown). ITO used forelectrodes/traces in small PROCAP touch panels typically has a sheetresistance of at least about 100 ohms/square, which has been found to betoo high for certain applications. Moreover, conventional ITO coatingsfor touch panels are typically highly crystalline and relatively thickand brittle, and thus in applications involving bending such ITOcoatings are subject to failure.

Referring to FIG. 1(b), x-axis conductor 12 (e.g., ITO) is formed onsubstrate 11. The ITO is coated in a continuous layer on substrate 11and then is subjected to a first photolithography process in order topattern the ITO into x-axis conductors 12. FIG. 1(c) illustrates crosssection A-A′ of FIG. 1(b), including x-axis conductor 12 formed onsubstrate 11. Referring to FIG. 1(d), insulator 13 is then formed on thesubstrate 11 over x-axis channel(s) of x-axis conductor 12. FIG. 1(e)illustrates cross section B-B′ of FIG. 1(d), including insulator 13which is formed on substrate 11 and x-axis conductor 12. The insulatorislands 13 shown in FIGS. 1(d)-(e) are formed by depositing a continuouslayer of insulating material (e.g., silicon nitride) on the substrate 11over the conductors 12, and then subjecting the insulating material to asecond photolithography, etching, or other patterning process in orderto pattern the insulating material into islands 13. Referring to FIG.1(f), y-axis conductors 14 are then formed on the substrate over theinsulator islands 13 and x-axis conductors 12. The ITO for y-axisconductors 14 is coated on substrate 11 over 12, 13, and then issubjected to a third photolithography or other patterning process inorder to pattern the ITO into y-axis conductors 14. While much of y-axisconductor material 14 is formed directly on substrate 11, the y-axischannel is formed on insulator 13 to inhibit conductivity between x-axisconductors 12 and y-axis conductors 14. FIG. 1(g) illustrates crosssection C-C′ of FIG. 1(f), including part of an ITO y-axis conductor 14,which is formed on the substrate 11 over insulative island 13 and overan example ITO x-axis conductor 12. It will be appreciated that theprocess of manufacturing the structure shown in FIGS. 1(a)-(g) requiresthree separate and distinct deposition steps and three photolithographytype processes, which renders the process of manufacture burdensome,inefficient, and costly.

FIG. 1(h) illustrates another example of an intersection of ITO x-axisconductor 12 and ITO y-axis conductor 14 according to a related artprojected capacitive touch panel. Referring to FIG. 1(h), an ITO layeris formed on the substrate 11 and can then be patterned into x-axisconductors 12 and y-axis conductors 14 in a first photolithographyprocess. Then, an insulating layer is formed on the substrate and ispatterned into insulator islands 13 in a second photolithography oretching process. Then, a conductive layer is formed on the substrate 11over 12-14 and is patterned into conductive bridges 16 in a thirdphotolithography process. Bridge 16 provides electrical conductivity fora y-axis conductor 14 over an x-axis conductor 12. Again, this processof manufacture requires at least three deposition steps and at leastthree different photolithography processes.

The projected capacitive touch panels illustrated in FIGS. 1(a) through1(h) may be mutual capacitive devices or self-capacitive devices. In amutual capacitive device, there is a capacitor at every intersectionbetween an x-axis conductor 12 and a y-axis conductor 14 (or metalbridge 16). A voltage is applied to x-axis conductors 12 while thevoltage of y-axis conductors 14 is measured (and/or vice versa). When auser brings a finger or conductive stylus close to the surface of thedevice, changes in the local electrostatic field reduce the mutualcapacitance. The capacitance change at every individual point on thegrid can be measured to accurately determine the touch location. In aself-capacitive device, the x-axis conductors 12 and y-axis conductors14 operate essentially independently. With self-capacitance, thecapacitive load of a finger or the like is measured on each x-axisconductor 12 and y-axis conductor 14 by a current meter.

As described above, prior art transparent conductors 12 and 14 in touchpanels are typically indium tin oxide (ITO), which is problematic for anumber of reasons. First, ITO is costly. Second, thin layers of ITO havea high sheet resistance R_(s) (typically at least about 100ohms/square); in other words the conductivity of ITO is not particularlygood and its resistivity is high. In order for an ITO layer to have asheet resistance less than 5 ohms/square, the ITO layer must beextremely thick (for example, greater than 400 nm). However, such athick layer of ITO is both prohibitively expensive and less transparent.Thus, the high sheet resistance of thin layers of ITO limits their usein layouts requiring long narrow traces on touch panels, with anemphasis on large panels. Accordingly, it will be appreciated that thereexists a need in the art for touch panel electrodes that are of materialwhich does not suffer from the ITO disadvantage combination of high costand low conductivity at small thicknesses.

SUMMARY OF EXAMPLE EMBODIMENTS

Example embodiments of this invention relate to a multi-layer conductivecoating that is substantially transparent to visible light, contains atleast one conductive layer comprising silver that is sandwiched betweenat least a pair of dielectric layers, and may be used as an electrodeand/or conductive trace in a capacitive touch panel. The multi-layerconductive coating may contain a layer of or including zirconium oxide(e.g., ZrO₂) and/or silicon nitride in certain embodiments, and may beused in applications such as capacitive touch panels for controllingshowers, appliances, vending machines, electronics, electronic devices,and/or the like. The coating has improved conductivity (e.g., smallersheet resistance R_(s) or smaller emissivity, given a similar thicknessand/or cost of deposition) compared to typical ITO coatings used intouch panels. The coating may be used as electrode layers and/or tracesin capacitive touch panels such as PROCAP touch panel or any other typeof touch panel. The touch panel may further include a functional film(s)which may be one or more of: an index-matching film, an antiglare film,an anti-fingerprint film, and anti-microbial film, a scratch resistantfilm, and/or an antireflective (AR) film.

In an example embodiment of this invention, there is provided acapacitive touch panel comprising: a glass substrate; a multi-layertransparent conductive coating supported by the glass substrate, themulti-layer transparent conductive coating including at least oneconductive layer comprising silver, a dielectric layer comprising zincoxide under and directly contacting the conductive layer comprisingsilver, and a dielectric layer comprising zirconium oxide and/or siliconnitride over the conductive layer comprising silver; a plurality ofelectrodes and a plurality of conductive traces, wherein the electrodesand/or the conductive traces include the multi-layer transparentconductive coating; a processor for detecting touch position on thetouch panel; wherein the electrodes are formed substantially in a commonplane substantially parallel to the glass substrate; and a plurality ofthe electrodes are electrically connected to the processor by conductivetraces. The glass substrate may further support a functional film. Thefunctional film may be on either, or both, sides of the glass substrate.The functional film may be one or more of an index-matching film, anantiglare film, an anti-fingerprint film, and anti-microbial film, ascratch resistant film, and/or an antireflective (AR) film.

The multi-layer transparent conductive coating may have a sheetresistance of less than or equal to about 40 ohms/square, morepreferably less than or equal to about 15 ohms/square, more preferablyless than or equal to about 10 ohms/square, and most preferably lessthan or equal to about 5 ohms/square.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1(a) to 1(h) illustrate examples of prior art projected capacitivetouch panels.

FIG. 2(a) illustrates a top or bottom plan layout of a projectedcapacitive touch panel according to an exemplary embodiment, that maycontain the coating(s) of FIGS. 4, 6, 7, and/or 8 as conductiveelectrode(s) and/or conductive trace(s).

FIG. 2(b) illustrates a schematic representation of circuitry for theprojected capacitive touch panel of FIG. 2(a), 3, 9, and/or 10.

FIG. 3 illustrates a top or bottom plan layout of a projected capacitivetouch panel according to another example embodiment, that may containthe coating(s) of FIGS. 4, 6, 7, and/or 8 as conductive electrode(s)and/or conductive trace(s).

FIGS. 4(a)-4(g) are cross-sectional views of various silver-inclusivetransparent conductive coatings for use in a touch panel of FIGS. 2, 3,7, 8, 9, 10, 11, 12, 13 and/or 14 according to exemplary embodiments ofthis invention.

FIG. 5 is a percent visible transmission/reflectance vs. wavelength (nm)graph illustrating the visible transmission (TR) percentage and glassside visible reflection (BRA) percentage of a Comparative Example (CE)coating on a glass substrate, compared to those values for the glasssubstrate alone (Glass-TR, Glass-BRA).

FIG. 6 is a percent visible transmission/reflectance vs. wavelength (nm)graph illustrating the visible transmission (TR) and glass side visiblereflection (BRA) of an example coating of FIG. 4(a) according to anexample embodiment of this invention on a glass substrate, demonstratingthat it is transparent to visible light and has glass side visiblereflectance more closely matched to that of the glass substrate comparedto the CE in FIG. 5. FIG. 6, like FIG. 5, also illustrates the visibletransmission (Glass-TR) and visible reflectance (Glass-BRA) for theglass substrate alone without the coating on it.

FIG. 7 is a cross sectional view of a touch panel assembly according toan example embodiment of this invention, including a touch panelaccording to any of FIGS. 2-4, 6, 8-10 coupled to a liquid crystalpanel, for use in electronic devices such as portable phones, portablepads, computers, and/or so forth.

FIG. 8(a) is a percent visible transmission/reflectance vs. wavelength(nm) graph illustrating the visible transmission (CGN-TR or TR) andglass side visible reflection (CGN-BRA or BRA) of an example coating ofFIG. 4(b) according to another example embodiment of this invention,demonstrating that it is transparent to visible light and has a glassside visible reflectance more closely matched to the reflectance of theglass substrate alone compared to the CE. FIG. 8(a) also illustrates thevisible transmission (Glass-TR) and visible reflectance (Glass-BRA) forjust the glass substrate absent the coating.

FIG. 8(b) is a percent visible transmission/reflectance vs. wavelength(nm) graph illustrating the visible transmission (CGN-TR or TR) andglass side visible reflection (CGN-BRA or BRA) of an example coating ofFIG. 4(c) according to another example embodiment of this invention,demonstrating that it is transparent to visible light and has a glassside visible reflectance more closely matched to the reflectance of thesubstrate compared to the CE.

FIG. 9 illustrates a top or bottom plan layout of a low resolutioncapacitive touch panel according to another example embodiment, that maycontain the coating(s) of FIGS. 4, 6, 7, 8 as conductive electrode(s)and/or conductive trace(s).

FIG. 10 is a cross sectional view of a low resolution capacitive touchpanel according to another example embodiment where the substratesupporting the coating of this invention of FIG. 9 may be laminated toanother substrate (e.g., glass) via a polymer inclusive interlayer suchas PVB or EVA.

FIG. 11 is a flow chart of a process for making the transparentconductive coating pattern according to any of FIG. 2, 3, 4, 7, 8, 9, or10 according to an example embodiment of this invention.

FIG. 12 is a flow chart of a process for making the transparentconductive coating pattern according to any of FIG. 2, 3, 4, 7, 8, 9, or10 according to another example embodiment of this invention.

FIG. 13 is a flow chart of a process for making the transparentconductive coating pattern according to any of FIG. 2, 3, 4, 7, 8, 9, or10 according to another example embodiment of this invention.

FIG. 14 is a flow chart of a process for making the transparentconductive coating pattern according to any of FIG. 2, 3, 4, 7, 8, 9, or10 according to another example embodiment of this invention.

FIG. 15 is a cross sectional view of a capacitive touch panel accordingto an example embodiment of this invention, including the transparentconductive coating pattern according to any of FIG. 2, 3, 4, 7, 8, 9, or10 on surface #2, and an additional functional film provided on thesurface adapted to be touched by a user.

FIG. 16 is a cross sectional view of a capacitive touch panel accordingto another example embodiment of this invention, including thetransparent conductive coating pattern according to any of FIG. 2, 3, 4,7, 8, 9, or 10 on surface #3, and an additional functional film providedon the surface adapted to be touched by a user.

FIG. 17 is a cross sectional view of a monolithic capacitive touch panelaccording to another example embodiment of this invention, including thetransparent conductive coating pattern according to any of FIG. 2, 3, 4,7, 8, 9, or 10 on surface #2, and an additional functional film providedon the surface adapted to be touched by a user.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

A detailed description of exemplary embodiments is provided withreference to the accompanying drawings. Like reference numerals indicatelike parts throughout the drawings.

Example embodiments of this invention relate to a multi-layer conductivecoating 41 that is substantially transparent to visible light, containsat least one conductive layer comprising silver 46 that is sandwichedbetween at least a pair of dielectric layers, and may be used as anelectrode and/or conductive trace in a capacitive touch panel. Examplemulti-layer transparent conductive coatings 41 are shown in FIGS.4(a)-(g). The multi-layer conductive coating 41 may contain a layer ofor including zirconium oxide (e.g., ZrO₂) 75 in certain embodiments, andmay be used in applications such as capacitive touch panels forcontrolling showers (e.g., water on/off control, water temperaturecontrol, and/or steam control), appliances, vending machines, musiccontrol, thermostat control, electronics, electronic devices, and/or thelike. The layer of or including zirconium oxide 75 may be provided forimproving durability in touch panel applications. The zirconium oxideand/or DLC layers discussed herein provide for scratch resistance, andresistance to stains and cleaning chemicals in applications such asshower door/wall touch panel applications. In certain exampleembodiments, the coating includes a silver layer(s) 46 and may be usedas an electrode(s) and/or conductive trace(s) in a capacitive touchpanel so as to provide for an electrode(s) transparent to visible lightbut without much visibility due to closely matching visible reflectionof the coating on the substrate to that of an underlying substrate inareas where the coating is not present. The coating 41 has improvedconductivity (e.g., smaller sheet resistance R_(s) or smalleremissivity, given a similar thickness and/or cost of deposition)compared to typical ITO coatings used in touch panels. The coating maybe used as electrode layers and/or traces in capacitive touch panelssuch as PROCAP touch panels or any other type of touch panel. The touchpanels discussed herein, including the electrodes and traces of themulti-layer coating 41, preferably have a visible transmission (Ill. A,2 deg. Obs.) of at least 50%, more preferably of at least 60%, and mostpreferably of at least 70%.

In certain example embodiments of this invention, there is provided acapacitive touch panel that includes a glass substrate 40; a multi-layertransparent conductive coating 41 supported by the glass substrate 40.The multi-layer transparent conductive coating 41 may include at leastone conductive layer comprising silver 46, a dielectric layer comprisingzinc oxide 44 under and directly contacting the conductive layercomprising silver 46, and a dielectric layer comprising zirconium oxide75 over the conductive layer comprising silver 46, a plurality ofelectrodes and a plurality of conductive traces, wherein the electrodesand/or the conductive traces of the touch panel are made of themulti-layer transparent conductive coating 41. A processor may beprovided for detecting touch position on the touch panel; wherein theelectrodes, and the conductive traces may be formed substantially in acommon plane substantially parallel to the glass substrate 40, and aplurality of the electrodes are electrically connected to the processorby conductive traces. The glass substrate may be heat treated (e.g.,thermally tempered).

FIG. 2(a) illustrates a top or bottom plan layout of a projectedcapacitive touch panel according to an exemplary embodiment, that maycontain the multi-layer conductive transparent coating 41 of FIGS. 4, 6,7, and/or 8 as conductive electrode(s) x, y and/or conductive trace(s)22. Referring to FIG. 2(a), touch panel 20 is provided. Touch panel 20includes a matrix of electrodes x, y including n columns and m rows,provided on a substrate 40 such as a glass substrate. The glasssubstrates may also include an antireflective (AR) layer in certainexample embodiments. The matrix of row/column electrodes x, y may beprovided on the side of the substrate (e.g., glass substrate 40) that isopposite the side touched by person(s) using the touch panel, in orderto prevent corrosion of the silver-based coating 41 by human fingertouches. In other words, when the touch panel is touched by a finger,stylus, or the like, the glass substrate 40 is typically located between(a) the finger and (b) the matrix of row/column electrodes x, y andconductive traces 22. However, in certain embodiments the matrix ofrow/column electrodes x, y and traces may be provided on the side of thesubstrate (e.g., glass substrate 40) that is touched by person(s) usingthe touch panel, such as in shower door application, glass wallapplications, and/or the like, for example in situations where only oneglass substrate is provided. Change in capacitance between adjacent rowand column electrodes in the matrix as a result of the proximity of afinger or the like is sensed by the electronic circuitry, and theconnected circuitry can thus detect where the panel is being touched bya finger or the like. For example, referring to FIG. 2(a), row 0includes row electrodes x_(0,0), x_(1,0), x_(2,0), etc., through x_(n,0)and columns 0, 1 and 2 respectively include column electrodes y₀, y₁,y₂, etc., through y_(n). Optionally, the x electrodes in a columndirection may also be grouped for column sensing. The number of row andcolumn electrodes is determined by the size and resolution of the touchpanel. In this example, the top-right row electrode is x_(n,m). Each rowelectrode x_(0,0)-x_(0,0), of touch panel 20 is electrically connectedto interconnect area 21 and corresponding processing circuitry/softwareby a conductive trace 22. Each column electrode y₀-y_(n) is alsoelectrically connected to interconnect area 21 and correspondingprocessing circuitry/software, either directly or by a conductive trace.The conductive traces 22 are preferably formed of the same transparentconductive material (multilayer conductive transparent coating 41) asthe row and column electrodes (e.g, same material as at least rowelectrodes x_(0,0), x_(1,0), x_(2,0), etc.). Thus, in certain exampleembodiments, the matrix of row and column electrodes x, y andcorresponding traces 22 can be formed on the substrate (e.g., glasssubstrate) 40 by forming the coating 41 (e.g., by sputter-depositing thecoating 41) on the substrate 40 and by performing only one (or maximumtwo) photolithography and/or other patterning process in order topattern the coating 41 into the conductive electrodes x, y and/orcondutive traces 22. In certain example embodiments, thesilver-inclusive coating (e.g., see example coating 41 in FIGS.4(a)-(g)) is sputter deposited on the glass substrate 40 and is thensubjected to photolithography and/or laser patterning to pattern thesilver-inclusive coating 41 into traces 22, row electrodes x_(0,0),x_(1,0), x_(2,0), x_(0,1), x,_(0,2), x_(0,3), etc. through x_(n,m), andcolumn electrodes y₀-y_(n). Because the row electrodes x_(0,0)-x_(n,m),column electrodes y₀-y_(n), and traces 22 do not overlap as viewed fromabove/below, the row electrodes x_(0,0)-x_(n,m), column electrodesy₀-y_(n), and traces 22 may be formed on the same plane parallel (orsubstantially parallel) to glass substrate 40 on which the electrodesand traces are formed. And no insulating layer between electrodes x andy is needed in certain example embodiments. Significant portions oftraces 22 may also be parallel (or substantially parallel) to the columnelectrodes in the plane parallel (or substantially parallel) to thesubstrate 40. Accordingly, touch panel 20 may be made via a smallernumber of photolithography or laser patterning steps while achievingtraces that achieve sufficient transparency and conductivity, therebyreducing production costs and resulting in a more efficient touch panelfor use in a display assembly or the like.

FIG. 2(b) illustrates a schematic representation of circuitry for thetouch panel 20 illustrated in FIG. 2(a), according to exemplaryembodiments. In touch panel 20, there is a capacitance between each rowelectrode and the adjacent column electrode (for example, between rowelectrode x_(0,0) and column electrode y₀). This capacitance can bemeasured by applying a voltage to a column electrode (for example,column electrode y₀) and measuring the voltage of an adjacent rowelectrode (for example, row electrode x_(0,0)). When a user brings afinger or conductive stylus close to touch panel 20, changes in thelocal electrostatic field reduce the mutual capacitance. The capacitancechange at individual points on the surface can be measured by measuringeach pair of row electrodes and column electrodes in sequence. Thetraces 22 of each row electrode in the same row (for example, the traces22 of row electrodes x_(0,0), x_(1,0), x_(2,0), etc., through x_(n,0) ofrow 0) may be electrically connected together (as shown in FIG. 2(b)).The interconnection of the first row segments to each other, second rowsegments to each other, etc., may be made on a flexible circuit(s)attached at the periphery of the touch panel in the interconnectionarea, so that no cross-overs are needed on the glass substrate 40. Inthat instance, a voltage is applied to a column electrode and thevoltage of each row is measured in sequence before the process isrepeated with a voltage applied to another column. Alternatively, eachtrace 22 may be connected to signal processor 25 and the voltage of eachtrace 22 may be measured individually. The same capacitance may bemeasured by applying a voltage to a row electrode and measuring thevoltage on an adjacent column electrode rather than applying a voltageto a column electrode and measuring the voltage of an adjacent rowelectrode. Signal processing (for example, applying and measuringvoltages, measuring the capacitance between adjacent electrodes,measuring changes in capacitance over time, outputting signals inresponse to user inputs, etc.) may be performed by signal processor 25.Signal processor 25 may be one or more hardware processors, may includevolatile or non-volatile memory, and may include computer-readableinstructions for executing the signal processing. Signal processor 25 iselectrically connected to the column electrodes y₀-y_(n) andelectrically connected to the row electrodes x_(0,0)-x_(n,m), throughthe traces 22. Signal processor 25 may or may not be located on the sameplane as row electrodes x_(0,0)-x_(n,m), column electrodes y₀-y_(n), andtraces 22 (for example, in interconnect area 21 of FIG. 2(a)).

FIG. 3 illustrates a top or bottom plan layout of a projected capacitivetouch panel according to another example embodiment, that includes thecoating 41 of any of FIGS. 4(a)-(g), 6, 7, and/or 8 patterned to formthe conductive electrode(s) x, y and/or conductive trace(s) 22.Referring to FIG. 3, touch panel 30 is similar to touch panel 20 of FIG.2(a), except that touch panel 30 is divided into upper section 31 andlower section 32, each of which includes a matrix of electrodes x, yincluding n columns and m rows. For example, row 0 of upper section 31includes row electrodes x_(0,0), x_(1,0), x_(2,0), etc., throughx_(n,0). Upper section 31 also includes column electrodes y₀, y₁, y₂,etc., through y_(n). Likewise, lower section 32 would also include rowelectrodes, and column electrodes y₀-y_(n) that may be electricallyseparate from the column electrodes y₀-y_(n) of the upper section 31.Thus, lower section 32 also includes a matrix of row electrodesincluding n columns and m rows, and n column electrodes. Lower section32 may have more or less rows than upper section 31 in different exampleembodiments. The number of row and column electrodes of touch panel 30is determined by the size and resolution of the touch panel. Each columnelectrode of upper section 31 is electrically connected to interconnectarea 21, and each row electrode of upper section 31 is electricallyconnected to interconnect area 21 by a trace 22. As with the FIG. 2embodiment, traces may or may not be used for connecting the columnelectrodes of upper section 31 to the interconnect area. Each columnelectrode of lower section 32 is electrically connected to interconnectarea 21′ and each row electrode of lower section 32 is electricallyconnected to interconnect area 21′ by a trace 22. Again, traces may ormay not be used for connecting the column electrodes of the lowersection 32 to the interconnect area 21′. Still referring to FIG. 3,touch panel 30 is similar to touch panel 20 in that there is acapacitance between each row electrode and the adjacent column electrodewhich may be measured by applying a voltage to a column electrode andmeasuring the voltage of an adjacent row electrode (or, alternatively,by applying a voltage to a row electrode and measuring the voltage of anadjacent column electrode). When a user brings a finger or conductivestylus close to touch panel 30, changes in the local electrostatic fieldreduce the mutual capacitance. The capacitance change at individualpoints on the surface can be measured by measuring the mutualcapacitance of each pair of row electrodes and column electrodes insequence. Because the row electrodes and column electrodes x, yillustrated in FIG. 3 do not overlap, the row electrodes and columnelectrodes may be formed on the same plane by patterned transparentconductive coating 41, in the manner explained above in connection withFIG. 2. Accordingly, electrode structure x, y for the touch panel 30 maybe thin in nature and may be patterned with one process (for example,one photolithography process or one laser patterning process) whichreduces the production cost of the projected capacitive touch panel.

As one of ordinary skill in the art would recognize, touch panels 20 and30 described are not limited to the orientation described above andshown in FIGS. 2-3. In other words, the terms “row,” “column” “x-axis,”and y-axis” as used in this application are not meant to imply aspecific direction. Touch panel 20 of FIG. 2(a), for example, may bemodified or rotated such that interconnect area 21 is located in anypart of touch panel 20.

As illustrated in FIGS. 2(a) and 3, narrow transparent conductive traces22 are routed to electrically connect electrodes to interconnect area 21(and interconnect area 21′). Because of the large resistance of thenarrow ITO traces, narrow ITO traces may only been used in small touchpanels, such as for smart phones. To use one of the layouts illustratedin FIGS. 2(a) and 3 on larger touch panels (for example, measuring morethan 10 inches diagonally) or otherwise, a transparent conductivecoating 41 with low sheet resistance is used. The silver inclusivecoating 41 shown in FIG. 4 (any of FIGS. 4(a)-(g)) for use in formingthe row/column electrodes x, y and traces 22, is advantageous in thisrespect because it has a much lower sheet resistance (and thus moreconductivity) than typical conventional ITO traces/electrodes.

Examples of multilayer silver-inclusive transparent conductive coatings(TCC) 41 with low sheet resistance, for forming row electrodes, columnelectrodes, and traces 22, are illustrated in FIG. 4 (FIGS. 4(a)-4(g))according to exemplary embodiments of this invention. The low sheetresistance and high transparency of the TCC 41 allow the TCC to form thelong narrow traces 22 as well as the row and column electrodes x, y.

Referring to FIG. 4(a), multilayer transparent conductive coating 41 inan example embodiment is provided, either directly or indirectly, onsubstrate 40. Substrate 40 may be, for example, glass. In alternativeembodiments discussed below, an anti-reflective (AR) coating may beprovided between the substrate 40 and the coating 41. Coating 41 mayinclude, for example, a dielectric high index layer 43 of or including amaterial such as titanium oxide or niobium oxide, which may includetitanium oxide (e.g., TiO₂ or other suitable stoichiometry); adielectric layer of or including zinc oxide 44, optionally doped withaluminum, to be in contact with the silver-based layer; a silver-basedconductive layer 46 on and directly contacting the zinc oxide basedlayer 44; an upper contact layer 47 including nickel and/or chromium orother suitable material which may be oxided and/or nitrided, that isover and contacting the silver-based conductive layer 46; a dielectrichigh index layer 48 of or including a material such as titanium oxide orniobium oxide, which may include titanium oxide (e.g., TiO₂ or othersuitable stoichiometry); a dielectric layer 49 of or including tin oxide(e.g., SnO₂); and a dielectric layer 50 of or including silicon nitrideand/or silicon oxynitride which may be doped with from 1-8% Al forexample. Each of the layers in the coating 41 is designed to besubstantially transparent (e.g., at least 70% or at least 80%transparent) to visible light. The dielectric high index layer 43 may befully oxidized or sub-stoichiometric in different example embodiments.The silver layer 46 may or may not be doped with other materials (e.g.,Pd) in certain example embodiments. Upper contact layer 47 may be of orinclude materials such as NiCr, NiCrO_(x), NiCrN_(x), NiCrON_(x),NiCrMo, MiCrMoO_(x), TiO_(x), or the like.

The coating 41 is designed to achieve good conductivity via conductivesilver based layer 46, while optionally at the same time to reducevisibility by more closely matching is visible reflectance (glass sideand/or film side visible reflectance) to the visible reflectance of thesupporting substrate 40. Note that the glass side visible reflectance ismeasured from the side of the coated glass substrate opposite thecoating, whereas the film side visible reflectance is measured from theside of the coated glass substrate having the coating. Substantialmatching of the visible reflectance of the coating 41 and the visiblereflectance of the supporting glass substrate 40 reduces visibility ofthe electrodes and traces formed of the coating material 41.Surprisingly and unexpectedly, it has been found that adjusting certaindielectric thicknesses of the FIG. 4(a) coating can surprising improve(reduce) the visibility of the coating 41 and thus make the patternedelectrodes and traces of the touch panel less visible to users andtherefore more aesthetically pleasing.

While various thicknesses and materials may be used in layers indifferent embodiments of this invention, example thicknesses andmaterials for the respective sputter-deposited layers of coating 41 onthe glass substrate 40 in the FIG. 4(a) embodiment are as follows, fromthe glass substrate outwardly:

TABLE 1 FIG. 4(a) Transparent Conductive Coating Preferred MorePreferred Example Ref Material Thickness (Å) Thickness (Å) Thickness (Å)43 TiO_(x) 130-185 150-185 177 44 ZnO  50-140  60-100 83 46 Ag  90-160115-140 124 47 NiCrOx 15-50 15-30 20 48 TiO_(x) 10-60 15-35 23 49 SnO₂ 80-220 110-150 130 50 Si_(x)N_(y) 300-400 300-320 305

It is noted that the above materials for coating 41 in the FIG. 4(a)embodiment are exemplary, so that other material(s) may instead be usedand certain layers may be omitted in certain example embodiments. Thiscoating has both low sheet resistance, and has layers designed to reducevisibility of the coating 41 on the supporting glass substrate 40. Incertain exemplary embodiments, glass substrate 40 with coating 41thereon may be heat treated (e.g., thermally tempered), e.g., aftercoating, or chemically strengthened before coating.

In FIGS. 4(a)-(g), silver-inclusive coating 41 is inexpensive, has a lowsheet resistance (preferably less than 40 ohms/square, more preferablyless than 15 ohms/square, even more preferably less than about 10 or 5ohms/square, with an example being approximately 4 ohms per square) andmaintains high visible transmittance (preferably at least 60%, morepreferably at least 70%, more preferably at least 80%, and mostpreferably at least 84%). The coating 41 preferably has a sheetresistance (R_(s)) of no greater than 8 ohms/square, more preferably nogreater than 6 ohms/square, and most preferably no greater than about 4ohms/square. The coating 41 is preferably deposited on substantially theentirety of the major surface of the glass substrate 40, and thenpatterned to form the electrodes and traces. For example, the exampledisplay assembly shown in FIG. 7 includes a touch panel (20 or 30 or 50)mounted on a liquid crystal display panel (100-300). In the FIG. 7embodiment, the row electrodes, column electrodes, and traces are formedfrom coating 41 on the surface of the glass substrate 40 opposite thefinger, and the touch panel (20, 30 or 50) may be adhered to the LCDpanel via an index-matching adhesive layer 85. The LCD panel includesfirst and second substrates (e.g., glass substrates) 100, 200 with aliquid crystal layer 300 provided therebetween. In order to form atouchscreen, the touch panel 20, 30 may optionally be mounted on the LCDpanel with a small air gap or bonded to the display with anindex-matching adhesive 85. Thus, reference numeral 85 in FIG. 7represents either an air gap or an index matching adhesive between thedisplay and the touch panel. It is noted that for the measurements takenfor FIGS. 5-6 and 8(a)-(b), an air gap 85 was assumed so that thecoating 41 was adjacent an air gap 85. In air gap embodiments, theperiphery of the substrate 40 supporting the coating 41 may be bonded tothe liquid crystal panel via adhesive or any other suitable type of edgeseal material.

The pixel pitch for projected capacitive touch panels may, for example,be in the range of from about 6 to 7 mm. Touch location can bedetermined more accurately for example, to about 1 mm, by signalprocessing and interpolation. If the line width/spacing for the traces22 is approximately 10 μm to 20 μm, it can be calculated that aprojected capacitive touch panel of at least 20 inches (measureddiagonally) is possible for a TCC sheet resistance of about 4ohms/square. Further optimization of the routing, signal processingand/or noise suppression allows for production of even larger touchpanels (for example, up to 40 or 50 inches diagonally). This inventionis also applicable to smaller touch panels in certain exampleembodiments.

Example 1 Vs. Comparative Example (CE)

Surprisingly and unexpectedly, it has been found that adjusting certaindielectric thicknesses of the FIG. 4(a) coating can surprisingly reducethe visibility of the coating 41 on the supporting substrate 40, andthus make the electrodes and traces of the touch panel less visible tousers and therefore the overall panel more aesthetically pleasing. Thisis evidenced, for example, by the comparison below between a ComparativeExample (CE) and Example 1 of this invention, where the coatings includefrom the glass substrate outwardly:

TABLE 2 Comparative Example (CE) vs. Example 1 Comparative Example (CE)Example 1 Ref Material Thickness (Å) Thickness (Å) 43 TiO_(x) 194 177 44ZnO 83 83 46 Ag 124 124 47 NiCrOx 20 20 48 TiO_(x) 23 23 49 SnO₂ 30 13050 Si_(x)N_(y) 295 305

It can be seen from Table 2 above that the only difference betweenExample 1 according to this invention and the Comparative Example (CE)are the thicknesses of the dielectric layers 43 and 50. Surprisingly andunexpectedly, it has been found that adjusting the thicknesses of layers43 and 50 the coating can surprising reduce the visibility of thecoating 41 areas on the supporting glass substrate 40 by more closelymatching the visible reflectance (e.g., glass side visible reflectance)of the coating 41 on the glass substrate to the visible reflection ofthe glass substrate 40 alone, and thus make the electrodes and traces ofthe touch panel less visible to users and therefore more aestheticallypleasing. This is shown in FIGS. 5-6 and also in the tables below.

FIG. 5 is a percent transmission/reflectance vs. wavelength (nm) graphillustrating the visible transmission (TR) percentage and glass sidevisible reflection (BRA) percentage of the Comparative Example (CE)coating on a glass substrate, compared to those values for the glasssubstrate alone (Glass-TR, Glass-BRA). Note that FIG. 5 includes thevisible spectrum, as well as some wavelength outside the visiblespectrum. The line plot with the “x” through it in FIG. 5 is the glassside visible reflection of the CE coating on the glass substrate 40(i.e., reflection taken from the side of the finger in FIG. 7), and theline plot in FIG. 5 with the triangle marking through it is the visiblereflection of the glass substrate 40 alone in areas where the coating 41is not present. The difference between these two lines is important,because it shows the difference in glass side visible reflectionbetween: (a) areas of the glass substrate 40 where the CE coating is notpresent (i.e., in non-electrode and non-trace areas), and (b) areas ofthe glass substrate 40 where the CE coating is present (i.e., inelectrode and trace areas). Thus, the larger the difference betweenthese two lines (the bottom two lines in the FIG. 5 graph), the morevisible the electrodes and traces are to a viewer from the point of viewon the finger side in FIG. 7. It can be seen in FIG. 5 that there is asignificant gap (more than 2.0 difference in reflectance percentage)between these two lines around the visible wavelength 600 nm (includingon both sides thereof), meaning that the electrodes and traces on atouch panel made of the CE material will be very visible which canrender a touch panel or the like aesthetically non-pleasing.

In contrast, FIG. 6 is a percent visible transmission/reflectance vs.wavelength (nm) graph illustrating the visible transmission (CGN-TR orTR) and glass side visible reflection (CGN-BRA or BRA) of the Example 1coating of FIG. 4(a) according to an example embodiment of thisinvention on a glass substrate, demonstrating that it is transparent tovisible light and has glass side visible reflectance more closelymatched to that of the glass substrate compared to the CE in FIG. 5.FIG. 6, like FIG. 5, also illustrates the visible transmission(Glass-TR) and visible reflectance (Glass-BRA) for the glass substratealone in areas without the coating on it. The line plot with the “x”through it in FIG. 6 is the glass side visible reflection of the Example1 coating 41 on the glass substrate 40, and the line plot in FIG. 6 withthe triangular marking through it is the visible reflection of the glasssubstrate 40 alone without the coating 41 on it. The difference betweenthese two lines is important, because it shows the difference in visiblereflection (from the point of view of the finger in FIG. 7) between (a)areas of the glass substrate and touch panel where coating 41 is notpresent (i.e., in non-electrode and non-trace areas), and (b) areas ofthe glass substrate and touch panel where the coating 41 is present(i.e., in electrode and trace areas). Thus, the larger the differencebetween these two lines (the bottom two lines in the FIG. 6 graph), themore visible the electrodes and traces are to a viewer. And the smallerthe difference between these two lines (the bottom two lines in the FIG.6 graph), the less visible the electrodes and traces are to a viewer.Comparing FIGS. 5 and 6 to each other, it can be seen that in FIG. 6that there is a much smaller gap (if any) between these two lines forthe visible wavelengths from about 550 nm to about 650 nm compared tothe larger gap for the CE in FIG. 5, meaning that the electrodes andtraces on a touch panel made of the Example 1 material (FIG. 6) will bemuch less visible (compared to the CE material of FIG. 5) which rendersthe touch panel more aesthetically pleasing. In other words, compared tothe CE, Example 1 more closely matches the glass side visiblereflectance of the coating 41 on the glass substrate 40 to the visiblereflection of the glass substrate 40 in areas where the coating is notpresent, and thus make the electrodes and traces of the touch panel lessvisible to users and therefore more aesthetically pleasing.

The table below shows optical differences between the ComparativeExample (CE) and Example 1, where at 550 nm TR is visible transmission,RA is film side visible reflectance which is measured viewing theglass/coating combination from the coating side, and BRA is glass sidevisible reflectance which is measured viewing the glass/coatingcombination from the glass side. As will be recognized by one skilled inthe art, a* and b* are color values measured with respect totransmissive color [a*(TR) and b*(TR)], and glass side reflective color[a*(BRA and b*(BRA)].

TABLE 3 Comparative Example (CE) vs. Example 1 (Optical Parameters)[Ill. C 2 deg.] Comparative Example 1 on Example (CE) glass substrateGlass on glass (FIG. 4a substrate Parameter substrate embodiment) aloneTR (%)  88% 85.47% 91.7% a* (TR) −1 −0.60 −0.35 b* (TR) 1.5 1.05 0.18BRA (%) 5.8% 8.20% 8.11% a* (BRA) −2.2 −2.37 −0.17 b* (BRA) −6 −6.43−0.74

The glass side visible reflection (BRA) of the coating 41 on the glasssubstrate 40 for Example 1 more closely matches the visible reflectionof the glass substrate 40 alone (8.20% vs. 8.11%), compared to the CE(5.8% vs. 8.11%). Thus, the patterned coating 41 on the glass substrate40 is much less visible for Example 1 compared to the CE.

In certain example embodiments of this invention (e.g., FIGS. 2-7), thecoating 41 (unlike the CE) on a glass substrate 40 has a film sidevisible reflectance (RA) from 550-600 nm of from 7-10%, more preferablyfrom 7.5 to 8.5%. And in certain example embodiments of this invention,the coating 41 (unlike the CE) on a glass substrate 40 has a glass sidevisible reflectance (BRA) from 550-600 nm of from 7-13%, more preferablyfrom 7-9%, and still more preferably from 7.25 to 8.75% (the BRA for theCE was only 5.8% as seen above). In certain example embodiments of thisinvention, unlike the CE, there is no more than a 2.0 difference (morepreferably no more than a 1.5 or 1.0 difference) at 550 nm and/or 600nm, or in the range from 550-600 nm, between: (a) the film side and/orglass side visible reflectance percentage of a coated article includingthe coating 41 on a glass substrate 40 (in the area where the coating 41is present), and (b) the visible reflectance percentage of the glasssubstrate alone in areas where coating 41 is not present. This can beseen in FIG. 6 for example (see also FIGS. 8(a)-(b)). In contrast, forexample, for the CE it can be seen from the above that there is a 2.31difference (8.11%−5.8%=2.31) between (a) the glass side visiblereflectance percentage of a coated article including the CE coating on aglass substrate 40 in the area where the coating 41 is present, and (b)the visible reflectance percentage of the glass substrate alone, whichis too much of a difference and renders the electrodes and traces easilyvisible to viewers viewing the device from the side of the finger shownin FIG. 7. Example embodiments of this invention have reduced thisdifference to no more than 2.0, more preferably no more than 1.5, andmost preferably no more than 1.0.

While the Comparative Example (CE) is discussed above in connection withcomparison to Example 1, it is noted that the coatings of both the CEand Example 1 may be used as the electrodes and/or traces in a touchpanel according to example embodiments of this invention.

In certain example embodiments, an antireflective (AR) coating may beprovided between the glass substrate 40 and the coating 41 of any ofFIGS. 4(a)-(g) to still more closely match the visible reflectance(glass side and/or film side) of the coating to that of the supportingsubstrate (glass plus AR coating). The AR coating may be applied acrossthe entire or substantially the entire major surface of the glasssubstrate 40, and unlike the transparent conductive coating 41, the ARcoating need not be patterned in certain example embodiments. As anotheroptional, an AR coating may in effect be provided as a bottom portion ofthe coating 41 in order to add AR effect to the coating 41.

FIG. 4(b) illustrates a multilayer transparent conductive coating 41according to another example embodiment which may be provided, eitherdirectly or indirectly, substrate 40 in any of the devices or productsdiscussed herein (e.g., see FIGS. 2-3, 7 and 9-14). Substrate 40 may be,for example, glass or glass coated with an AR coating. Coating 41 of theFIG. 4(b) embodiment may include, for example, base dielectric layer 61or of including silicon nitride (e.g., Si₃N₄ or other suitablestoichiometry), which may or may not be doped with Al and/or oxygen; lowindex dielectric layer 62 of or including silicon oxide (e.g., SiO₂ orother suitable stoichiometry) which may or may not be doped with Aland/or nitrogen; a dielectric high index layer 43 of or including amaterial such as titanium oxide or niobium oxide, which may includetitanium oxide (e.g., TiO₂ or other suitable stoichiometry); adielectric layer of or including zinc oxide 44, optionally doped withaluminum, to be in contact with the silver-based layer; a silver-basedconductive layer 46 on and directly contacting the zinc oxide basedlayer 44; an upper contact layer 47 including nickel and/or chromiumwhich may be oxided and/or nitrided, that is over and contacting thesilver-based conductive layer 46; a dielectric high index layer 48 of orincluding a material such as titanium oxide or niobium oxide, which mayinclude titanium oxide (e.g., TiO₂ or other suitable stoichiometry); adielectric layer 49 of or including tin oxide (e.g., SnO₂); and anouter-most protective dielectric layer 50 of or including siliconnitride and/or silicon oxynitride. Each of the layers in the coating 41is designed to be substantially transparent (e.g., at least 70% or atleast 80% transparent) to visible light. The silver layer 46 may or maynot be doped with other materials (e.g., Pd) in certain exampleembodiments.

The coatings 41 of FIGS. 4(a)-(c) are designed to achieve goodconductivity while at the same time to reduce visibility by more closelymatching is visible reflectance (glass side and/or film side visiblereflectance) to the visible reflectance of the supporting substrate 40.Substantial matching of the visible reflectance of the coating 41 andthe visible reflectance of the supporting glass substrate 40 reducesvisibility of the electrodes and traces formed of the coating material41. While various thicknesses and materials may be used in layers indifferent embodiments of this invention, example thicknesses andmaterials for the respective sputter-deposited layers of coating 41 onthe glass substrate 40 in the FIG. 4(b) embodiment are as follows, fromthe glass substrate outwardly:

TABLE 4 FIG. 4(b) Transparent Conductive Coating Preferred MorePreferred Example Ref Material Thickness (Å) Thickness (Å) Thickness (Å)61 Si_(x)N_(y) 200-500 250-400 318 62 SiO_(x) 200-600 400-500 440 43TiO_(x) 130-185 150-185 354 44 ZnO  50-140  60-100 83 46 Ag  90-160115-140 124 47 NiCrOx 15-50 15-30 20 48 TiO_(x) 10-60 15-35 23 49 SnO₂ 80-220 110-150 130 50 Si_(x)N_(y) 300-400 300-320 303

It is noted that the above materials for FIG. 4(b) coating 41 areexemplary, so that other material(s) may instead be used and certainlayers may be omitted in certain example embodiments. This coating hasboth low sheet resistance, and has layers designed to reduce visibilityof the coating 41 on the supporting glass substrate 40. In certainexemplary embodiments, glass substrate 40 with coating 41 thereon may beheat treated (e.g., thermally tempered), e.g., after coating, orchemically strengthened before coating. As with the FIG. 4(a)embodiment, the silver-based coating 41 of the FIG. 4(b) embodiment isinexpensive, has a low sheet resistance (preferably less than 15ohms/square, more preferably less than about 10 or 5 ohms/square, withan example being approximately 4 ohms per square) and maintains highvisible transmittance (preferably at least 60%, more preferably at least70%, more preferably at least 80%, and most preferably at least 84%).The coating 41 is preferably deposited on substantially the entirety ofthe major surface of the glass substrate 40, and then patterned to formthe electrodes and/or traces discussed herein.

Example 2 Vs. Comparative Example (CE)

Example 2 utilizes a coating according to the FIG. 4(b) embodiment.Surprisingly and unexpectedly, it has been found that the FIG. 4(b)coating can surprisingly reduce the visibility of the coating 41 on thesupporting substrate 40, and thus make the electrodes and traces of thetouch panel less visible to users and therefore the overall panel moreaesthetically pleasing compared to the CE discussed above. This isevidenced, for example, by the comparison below between a ComparativeExample (CE) and Example 2 of this invention, where the coatings includefrom the glass substrate outwardly:

TABLE 5 Comparative Example (CE) vs. Example 2 Example 2 Ref MaterialThickness (Å) 61 Si₃N₄ 318 62 SiO₂ 440 43 TiO₂ 354 44 ZnO 83 46 Ag 12447 NiCrOx 20 48 TiO₂ 23 49 SnO₂ 130 50 Si₃N₄ 303

FIG. 5 is discussed above, and illustrates properties of the CE.

In contrast, FIG. 8(a) is a percent visible transmission/reflectance vs.wavelength (nm) graph illustrating the visible transmission (CGN-TR orTR) and glass side visible reflection (CGN-BRA or BRA) of Example 2 ofthis invention, demonstrating that it is transparent to visible lightand has a glass side visible reflectance more closely matched to thereflectance of the glass substrate alone compared to the CE of FIG. 5.FIG. 8(a) also illustrates the visible transmission (Glass-TR) andvisible reflectance (Glass-BRA) for just the glass substrate absent thecoating. The line plot with the “x” through it in FIG. 8(a) is the glassside visible reflection of the Example 2 coating 41 on the glasssubstrate 40, and the line plot in FIG. 8(a) with the triangular markingthrough it is the visible reflection of the glass substrate 40 alonewithout the coating 41 on it. The difference between these two lines issignificant, because it shows the difference in visible reflection (fromthe point of view of the finger in FIG. 7) between (a) areas of theglass substrate and touch panel where coating 41 is not present (i.e.,in non-electrode and non-trace areas), and (b) areas of the glasssubstrate and touch panel where the coating 41 is present (i.e., inelectrode and trace areas). Thus, the larger the difference betweenthese two lines (the bottom two lines in the FIG. 8(a) graph), the morevisible the electrodes and traces are to a viewer. And the smaller thedifference between these two lines (the bottom two lines in the FIG.8(a) graph), the less visible the electrodes and traces are to a viewer.Comparing FIGS. 5 and 8(a) to each other, it can be seen that in FIG.8(a) that there is a much smaller gap (if any) between these two linesfor the visible wavelengths from about 550 nm to about 650 nm comparedto the larger gap for the CE in FIG. 5, meaning that the electrodes andtraces on a touch panel made of the Example 2 material will be much lessvisible (compared to the CE material of FIG. 5) which renders the touchpanel more aesthetically pleasing. In other words, compared to the CE,Example 2 more closely matches the glass side visible reflectance of thecoating 41 on the glass substrate 40 to the visible reflection of theglass substrate 40 in areas where the coating is not present, and thusmake the electrodes and traces of the touch panel less visible to usersand therefore more aesthetically pleasing.

The table below shows optical differences between the ComparativeExample (CE) and Example 2, where at 550 nm TR is visible transmission,RA is film side visible reflectance which is measured viewing theglass/coating combination from the coating side, and BRA is glass sidevisible reflectance which is measured viewing the glass/coatingcombination from the glass side. As will be recognized by one skilled inthe art, a* and b* are color values measured with respect totransmissive color [a*(TR) and b*(TR)], and glass side reflective color[a*(BRA and b*(BRA)].

TABLE 6 Comparative Example (CE) vs. Example 2 (Optical Parameters)[Ill. C 2 deg.] Comparative Example 2 on Example (CE) glass substrateGlass on glass (FIG. 4b substrate Parameter substrate embodiment) aloneTR (%)  88% 85.75% 91.7% a* (TR) −1 −1.05 −0.35 b* (TR) 1.5 −0.31 0.18BRA (%) 5.8% 7.86% 8.11% a* (BRA) −2.2 0.02 −0.17 b* (BRA) −6 −0.33−0.74

It is important here that the glass side visible reflection (BRA) of thecoating 41 on the glass substrate 40 for Example 2 more closely matchesthe visible reflection of the glass substrate 40 alone (7.86% vs.8.11%), compared to the CE (5.8% vs. 8.11%). Thus, the patterned coating41 on the glass substrate 40 is much less visible for Example 2 comparedto the CE. As discussed above, in certain example embodiments of thisinvention (e.g., FIGS. 2-7), the coating 41 (unlike the CE) on a glasssubstrate 40 has a film side visible reflectance (RA) from 550-600 nm offrom 7-10%, more preferably from 7.5 to 8.5%. And in certain exampleembodiments of this invention, the coating 41 (unlike the CE) on a glasssubstrate 40 has a glass side visible reflectance (BRA) from 550-600 nmof from 7-13%, more preferably from 7-9%, and still more preferably from7.25 to 8.75% (the BRA for the CE was only 5.8% as seen above). As alsomentioned above, in certain example embodiments of this invention thereis no more than a 2.0 difference (more preferably no more than a 1.5 or1.0 difference) at 550 nm and/or 600 nm, or in the range from 550-600nm, between: (a) the film side and/or glass side visible reflectancepercentage of a coated article including the coating 41 on a glasssubstrate 40 (in the area where the coating 41 is present), and (b) thevisible reflectance percentage of the glass substrate alone in areaswhere coating 41 is not present. This can be seen in FIG. 8(a) forexample (see also FIGS. 6 and 8(b)). In contrast, for example, for theCE it can be seen from the above that there is a 2.31 difference(8.11%−5.8%=2.31) between (a) the glass side visible reflectancepercentage of a coated article including the CE coating on a glasssubstrate 40 in the area where the coating 41 is present, and (b) thevisible reflectance percentage of the glass substrate alone, which istoo much of a difference and renders the electrodes and traces easilyvisible to viewers viewing the device from the side of the finger shownin FIG. 7. Example embodiments of this invention have reduced thisdifference to no more than 2.0, more preferably no more than 1.5, andmost preferably no more than 1.0.

FIG. 4(c) illustrates a multilayer transparent conductive coating (41′or 41″) according to another example embodiment which may be provided,either directly or indirectly, substrate 40 in any of the devices orproducts discussed herein (e.g., see FIGS. 2-3, 7 and 9-14). Substrate40 may be, for example, glass. Coating 41′ of the FIG. 4(c) embodimentmay include, for example, an antireflective (AR) section 70 including adielectric high index layer 71 of or including a material such astitanium oxide or niobium oxide, which may include titanium oxide (e.g.,TiO₂ or other suitable stoichiometry); low index dielectric layer 72 ofor including silicon oxide (e.g., SiO₂ or other suitable stoichiometry)which may or may not be doped with Al and/or nitrogen; a dielectric highindex layer 73 of or including a material such as titanium oxide orniobium oxide; another low index dielectric layer 74 of or includingsilicon oxide (e.g., SiO₂ or other suitable stoichiometry) which may ormay not be doped with Al and/or nitrogen, and a dielectric layer 75 ofor including zirconium oxide (e.g., ZrO₂ or other suitablestoichiometry). The “substrate” in the FIG. 4(c) embodiment may beconsidered the glass 40 plus the AR section 70 of the coating, as the ARsection 70 of the coating 41′ need not be patterned along with the restof the coating 41′, and in such a case the transparent conductivecoating of the FIG. 4(c) embodiment may be considered to be made up ofjust the layers 61, 44, 46, 47 and 50. In other words, in the FIG. 4(c)embodiment, the multi-layer transparent conductive coating may beconsidered as 41″ which is made up of layers 61, 44, 46, 47 and 50, andthe “substrate” may be considered to be the combination of the glass 40and the AR coating 70.

The coating 41 of the FIG. 4(c) embodiment may further include, assection 41″, dielectric layer 61 or of including silicon nitride (e.g.,Si₃N₄ or other suitable stoichiometry), which may or may not be dopedwith Al and/or oxygen; a dielectric layer of or including zinc oxide 44,optionally doped with aluminum, to be in contact with the silver-basedlayer; a silver-based conductive layer 46 on and directly contacting thezinc oxide based layer 44; an upper contact layer 47 including nickeland/or chromium which may be oxided and/or nitrided, that is over andcontacting the silver-based conductive layer 46; optionally a dielectrichigh index layer 48 of or including a material such as titanium oxide orniobium oxide, which may include titanium oxide (e.g., TiO₂ or othersuitable stoichiometry); and an outer-most protective dielectric layer50 of or including silicon nitride and/or silicon oxynitride. Each ofthe layers in the coating 41 of the FIG. 4(a)-(c) embodiments isdesigned to be substantially transparent (e.g., at least 70% or at least80% transparent) to visible light.

The coating 41 of FIG. 4(c) is designed to achieve good conductivitywhile at the same time to reduce visibility by more closely matching isvisible reflectance (glass side and/or film side visible reflectance) tothe visible reflectance of the supporting substrate. Substantialmatching of the visible reflectance of the coating 41 and the visiblereflectance of the supporting substrate reduces visibility of theelectrodes and traces formed of the coating material 41. While variousthicknesses and materials may be used in layers in different embodimentsof this invention, example thicknesses and materials for the respectivesputter-deposited layers of coating 41 on the glass 40 in the FIG. 4(c)embodiment are as follows, from the glass outwardly:

TABLE 7 FIG. 4(c) Coating Preferred More Preferred Example Ref MaterialThickness (Å) Thickness (Å) Thickness (Å) 71 TiO_(x) 40-350  50-250 10072 SiO_(x) 200-600  300-450 373 73 NbO_(x) 200-2000  500-1500 1112 74SiO_(x) 200-1200 500-950 744 75 ZrO_(x) 30-120 30-80 50 61 Si_(x)N_(y)150-500  200-400 271 44 ZnO 50-140  60-100 83 46 Ag 90-160 115-150 13147 NiCrOx 15-50  15-30 20 50 Si_(x)N_(y) 300-450  300-350 339

It is noted that the above materials for FIG. 4(c) coating 41 areexemplary, so that other material(s) may instead be used and certainlayers may be omitted in certain example embodiments. The coating hasboth low sheet resistance, and has layers designed to reduce visibilityof the coating 41 on the supporting substrate. In certain exemplaryembodiments, glass substrate 40 with coating 41 thereon may be heattreated (e.g., thermally tempered), e.g., after coating, or chemicallystrengthened before coating. As with the FIG. 4(a)-(b) embodiments, thesilver-based coating 41 of the FIG. 4(c) embodiment is inexpensive, hasa low sheet resistance (preferably less than 15 ohms/square, morepreferably less than about 10 or 5 ohms/square, with an example beingapproximately 4 ohms per square) and maintains high visibletransmittance (preferably at least 60%, more preferably at least 70%,more preferably at least 80%, and most preferably at least 84%). Thecoating 41 is preferably deposited on substantially the entirety of themajor surface of the glass substrate 40 and then patterned to form theelectrodes and traces discussed herein.

Example 3 Vs. Comparative Example (CE)

Example 3 utilizes a coating according to the FIG. 4(c) embodiment.Surprisingly and unexpectedly, it has been found that the FIG. 4(c)coating can surprisingly reduce the visibility of the coating 41 on thesupporting substrate, and thus make the electrodes and traces of thetouch panel less visible to users and therefore the overall panel moreaesthetically pleasing compared to the CE discussed above. This isevidenced, for example, by the comparison below between a ComparativeExample (CE) and Example 3 of this invention, where the coatings includefrom the glass outwardly:

TABLE 8 Comparative Example (CE) vs. Example 3 Example 3 Ref MaterialThickness (Å) 71 TiO₂ 100 72 SiO₂ 373 73 NbO_(x) 1112 74 SiO₂ 744 75ZrO₂ 50 61 Si₃N₄ 271 44 ZnO 83 46 Ag 131 47 NiCrOx 20 50 Si₃N₄ 339

FIG. 5 is discussed above, and illustrates properties of the CE.

In contrast, FIG. 8(b) is a percent visible transmission/reflectance vs.wavelength (nm) graph illustrating the visible transmission (CGN-TR orTR) and glass side visible reflection (CGN-BRA or BRA) of Example 3according to another example embodiment of this invention, demonstratingthat it is transparent to visible light and has a glass side visiblereflectance more closely matched to the reflectance of the substratecompared to the CE. FIG. 8(b) also illustrates the visible transmission(Glass-TR) and visible reflectance (Glass-BRA) for just the glasssubstrate and AR section 71-75 absent the other layers (61, 44, 46, 47and 50) of the coating. The line plot with the “x” through it in FIG.8(b) is the glass side visible reflection of the Example 3 coating 41 onthe glass substrate 40, and the line plot in FIG. 8(b) with thetriangular marking through it is the visible reflection of the glasssubstrate 40 with only the AR section 70-75 thereon. The differencebetween these two lines is important, because it shows the difference invisible reflection (from the point of view of the finger in FIG. 7)between (a) areas of the glass substrate and touch panel where just theAR section of the coating is present (i.e., in non-electrode andnon-trace areas), and (b) areas of the glass substrate and touch panelwhere the entire coating 41 is present (i.e., in electrode and traceareas). Thus, the larger the difference between these two lines (thebottom two lines in the FIG. 8(b) graph), the more visible theelectrodes and traces are to a viewer. And the smaller the differencebetween these two lines (the bottom two lines in the FIG. 8(b) graph),the less visible the electrodes and traces are to a viewer. ComparingFIGS. 5 and 8(b) to each other, it can be seen that in FIG. 8(b) thatthere is a much smaller gap (if any) between these two lines for thevisible wavelengths from about 550 nm to about 650 nm compared to thelarger gap for the CE in FIG. 5, meaning that the electrodes and traceson a touch panel made of the Example 3 material will be much lessvisible (compared to the CE material of FIG. 5) which renders the touchpanel more aesthetically pleasing. In other words, compared to the CE,Example 3 more closely matches the glass side visible reflectance of thecoating 41 on the glass substrate 40 to the visible reflection of thesupporting substrate (glass plus AR layers), and thus make theelectrodes and traces of the touch panel less visible to users andtherefore more aesthetically pleasing.

The table below shows optical characteristics of Example 3, where at 550nm TR is visible transmission, RA is film side visible reflectance whichis measured viewing the glass/coating combination from the coating side,and BRA is glass side visible reflectance which is measured viewing theglass/coating combination from the glass side. As will be recognized byone skilled in the art, a* and b* are color values measured with respectto transmissive color [a*(TR) and b*(TR)], and glass side reflectivecolor [a*(BRA and b*(BRA)]. In the table below for Example 3, the glasssubstrate parameters are for the glass substrate with only AR layers71-75 thereon across the entire substrate 40, and the Example 3parameters are for the entire coating 41 on the glass substrate 40(i.e., the AR layers 71-75 may be provided across substantially theentire substrate whereas the layers 61, 44, 46, 47 and 50 may bepatterned to form the electrodes and traces).

TABLE 9 Example 3 (Optical Parameters) [Ill. C 2 deg.] Example 3 onGlass substrate glass substrate with only AR (FIG. 4c layers 71-75Parameter embodiment) thereon TR (%) 85.61% 94.80% a* (TR) −0.78 −0.30b* (TR) −0.94 0.35 BRA (%) 4.99% 4.51% a* (BRA) −0.15 −0.44 b* (BRA)−1.38 −2.34

It is important here that the glass side visible reflection (BRA) of theentire coating 41 on the glass substrate 40 for Example 3 closelymatches the visible reflection of the glass substrate 40 with only theAR layers 71-75 thereon (4.99% vs. 4.51%). Thus, the patterned coatingportion (61, 44, 46, 47 and 50) on the substrate is much less visiblefor Example 3 compared to the CE. In certain example embodiments of thisinvention, the coating 41 (unlike the CE) of this embodiment on a glasssubstrate 40 has a glass side visible reflectance (BRA) from 550-600 nmof from 4-13%, more preferably from 4.5-9%, and still more preferablyfrom 4.5 to 8.75%. As also mentioned above, in certain exampleembodiments of this invention (FIGS. 2-14) there is no more than a 2.0difference (more preferably no more than a 1.5 or 1.0 difference) at 550nm and/or 600 nm, or in the range from 550-600 nm, between: (a) the filmside and/or glass side visible reflectance percentage of a coatedarticle including the entire coating 41 on a glass substrate 40 (in thearea where the coating 41 is entirely present), and (b) the visiblereflectance percentage of the glass substrate areas where only the glass40 and AR layers 71-75 are present. This can be seen in FIG. 8(b) forexample. In contrast, for example, for the CE it can be seen from theabove that there is a 2.31 difference (8.11%−5.8%=2.31) between (a) theglass side visible reflectance percentage of a coated article includingthe CE coating on a glass substrate 40 in the area where the coating 41is present, and (b) the visible reflectance percentage of the glasssubstrate alone, which is too much of a difference and renders theelectrodes and traces easily visible to viewers viewing the device fromthe side of the finger shown in FIG. 7. Example embodiments of thisinvention have reduced this difference to no more than 2.0, morepreferably no more than 1.5, and most preferably no more than 1.0.

FIG. 4(d) illustrates a multilayer transparent conductive coating 41according to another example embodiment which may be provided, eitherdirectly or indirectly, on substrate 40 in any of the devices orproducts discussed herein (e.g., see FIGS. 2-3, 7 and 9-14). Substrate40 may be, for example, glass or glass coated with an AR coating.Coating 41 of the FIG. 4(d) embodiment may include, for example, basedielectric layer 61 or of including silicon nitride (e.g., Si₃N₄ orother suitable stoichiometry) which may or may not be doped with Aland/or oxygen, silicon oxynitride, or other suitable dielectricmaterial; lower contact layer 44 of or including zinc oxide which may bedoped with from about 1-8% Al and is in contact with the silver basedlayer; silver-based conductive layer 46 on and directly contacting thelower contact layer 44; an upper contact layer 47 including nickeland/or chromium which may be oxided and/or nitrided that is over andcontacting the silver-based conductive layer 46; dielectric layer 50 ofor including silicon nitride and/or silicon oxynitride or other suitablematerial, dielectric layer of or including zirconium oxide (e.g., ZrO₂)75, and optionally protective layer of or including diamond-like carbon(DLC) 120. The DLC of layer 120 may, for example, be any of the DLCmaterials discussed in any of U.S. Pat. Nos. 6,261,693, 6,303,225,6,447,891, 7,622,161, and/or 8,277,946, which are incorporated herein byreference. Each of the layers in the coating 41 is designed to besubstantially transparent (e.g., at least 70% or at least 80%transparent) to visible light. The silver layer 46 may or may not bedoped with other materials (e.g., Pd) in certain example embodiments.Upper contact layer 47 may be of or include materials such as NiCr,NiCrO_(x), NiCrN_(x), NiCrON_(x), NiCrMo, MiCrMoO_(x), TiO_(x), or thelike.

While various thicknesses and materials may be used in layers indifferent embodiments of this invention, example thicknesses andmaterials for the respective sputter-deposited layers of coating 41 onthe glass 40 in the FIG. 4(d) embodiment are as follows, from the glassoutwardly:

FIG. 4(d) Coating Preferred More Preferred Example Ref MaterialThickness (Å) Thickness (Å) Thickness (Å) 61 Si_(x)N_(y) 150-500 200-400 271 44 ZnO 50-140  60-100 83 46 Ag 90-160 115-150 131 47 NiCrNx15-50  15-30 20 50 Si_(x)N_(y) 200-500  300-350 339 75 ZrO₂ 40-300 50-200 100 120 DLC 10-200  20-150 40-120

FIG. 4(e) illustrates a multilayer transparent conductive coating 41according to another example embodiment which may be provided, eitherdirectly or indirectly, on substrate 40 in any of the devices orproducts discussed herein (e.g., see FIGS. 2-3, 7 and 9-14). The FIG.4(e) coating is the same as the FIG. 4(d) coating, except that layer 120is not present in the FIG. 4(e) coating.

FIG. 4(f) illustrates a multilayer transparent conductive coating 41according to another example embodiment which may be provided, eitherdirectly or indirectly, on substrate 40 in any of the devices orproducts discussed herein (e.g., see FIGS. 2-3, 7 and 9-14). Substrate40 may be, for example, glass or glass coated with an AR coating.Coating 41 of the FIG. 4(f) embodiment may include, for example, basedielectric layer 61 or of including silicon nitride (e.g., Si₃N₄ orother suitable stoichiometry), which may or may not be doped with Aland/or oxygen; lower contact layer 101 in contact with the silver basedlayer and which may include nickel and/or chromium which may be oxidedand/or nitride; silver-based conductive layer 46 on and directlycontacting the lower contact layer 101; an upper contact layer 47including nickel and/or chromium which may be oxided and/or nitridedthat is over and contacting the silver-based conductive layer 46; and anprotective dielectric layer 50 of or including silicon nitride and/orsilicon oxynitride. Each of the layers in the coating 41 is designed tobe substantially transparent (e.g., at least 70% or at least 80%transparent) to visible light. The silver layer 46 may or may not bedoped with other materials (e.g., Pd) in certain example embodiments.Upper and lower contact layers 47 and 101 may be of or include materialssuch as NiCr, NiCrO_(x), NiCrN_(x), NiCrON_(x), NiCrMo, MiCrMoO_(x),TiO_(x), or the like. Optionally, a layer of or including diamond-likecarbon (DLC) or zirconium oxide (e.g., ZrO₂) may be provided as aprotective overcoat in the coating 41 over the layer 50 in the FIG. 4(f)embodiment. The zirconium oxide and/or DLC layers discussed hereinprovide for scratch resistance, and resistance to stains and cleaningchemicals in applications such as shower door/wall touch panelapplications.

While various thicknesses and materials may be used in layers indifferent embodiments of this invention, example thicknesses andmaterials for the respective sputter-deposited layers of coating 41 onthe glass 40 in the FIG. 4(f) embodiment are as follows, from the glassoutwardly:

FIG. 4(f) Coating Preferred More Preferred Example Ref MaterialThickness (Å) Thickness (Å) Thickness (Å) 61 Si_(x)N_(y) 10-500  20-200100 101 NiCrN_(x) 5-50 10-30 20 46 Ag 50-160 115-150 131 47 NiCrNx 5-5010-30 20 50 Si_(x)N_(y) 100-500  200-300 250

FIG. 4(g) illustrates a multilayer transparent conductive coating 41according to another example embodiment which may be provided, eitherdirectly or indirectly, on substrate 40 in any of the devices orproducts discussed herein (e.g., see FIGS. 2-3, 7 and 9-14). Substrate40 may be, for example, glass or glass coated with an AR coating.Coating 41 of the FIG. 4(g) embodiment may include, for example, basedielectric layer 61 or of including silicon nitride (e.g., Si₃N₄ orother suitable stoichiometry), which may or may not be doped with Aland/or oxygen; lower contact layer 44 in contact with the silver basedlayer and which may include zinc oxide which may be doped with Al asdiscussed herein; silver-based conductive layer 46 on and directlycontacting the lower contact layer 44; an upper contact layer 47including nickel and/or chromium which may be oxided and/or nitridedthat is over and contacting the silver-based conductive layer 46;dielectric layer 50 of or including silicon nitride and/or siliconoxynitride, which may be doped with from about 1-8% (atomic %) Al; andprotective overcoat of or including zirconium oxide (e.g., ZrO₂) 75.Each of the layers in the coating 41 is designed to be substantiallytransparent (e.g., at least 70% or at least 80% transparent) to visiblelight. The silver layer 46 may or may not be doped with other materials(e.g., Pd) in certain example embodiments. Upper contact layer 47 may beof or include materials such as NiCr, NiCrO_(x), NiCrN_(x), NiCrON_(x),NiCrMo, MiCrMoO_(x), TiO_(x), or the like. Optionally, a layer of orincluding diamond-like carbon (DLC) may be provided as a protectiveovercoat in the coating 41 over the layer 75 in the FIG. 4(g)embodiment. Note that layer 47 may optionally be omitted from the FIG.4(g) embodiment in certain example embodiments of this invention.

While various thicknesses and materials may be used in layers indifferent embodiments of this invention, example thicknesses andmaterials for the respective sputter-deposited layers of coating 41 onthe glass 40 in the FIG. 4(g) embodiment are as follows, from the glassoutwardly:

FIG. 4(g) Coating Preferred More Preferred Example Ref MaterialThickness (Å) Thickness (Å) Thickness (Å) 61 Si_(x)N_(y) 10-500  20-200100 44 ZnO 20-140  30-100 83 46 Ag 50-160 115-150 131 47 NiCrNx 5-5010-30 20 50 Si_(x)N_(y) 100-500  200-300 250 75 ZrO₂ 40-300  50-200 100

The coatings shown in any of FIGS. 4-6 of parent case Ser. No.13/685,871 (now U.S. Pat. No. 9,354,755, and incorporated herein byreference), and/or described elsewhere in parent case Ser. No.13/685,871, may be used as the multi-layer transparent conductivecoatings 41 in touch panels for electrodes and/or traces in any of thevarious embodiments discussed herein.

The patterned low sheet resistance coatings 41 herein (e.g., any of theFIG. 2-8 embodiments) may also be used in low resolution touch panelapplications (e.g., see FIG. 9). Example applications for touch panelsdiscussed herein are interactive storefronts, preferably standalone, butpossibly also in combination with a projected image on the glassassembly or with direct view displays, shower controls on glass basedshower doors or glass based shower walls, light controls on glass wallsin office buildings, controls for appliances such as ovens, stovetops,refrigerators, and the like. The glass substrate 40 may be flat orcurved (e.g., heat bent) in different embodiments of this invention. Thesilver based coatings 41 discussed herein are advantageous with respectto bent substrates, because conventional ITO coatings for touch panelsare typically highly crystalline and relatively thick and brittle whenbent, which can readily lead to failure of the ITO. In bent glassapplications, the glass or plastic substrate 40 may be bent for examplevia heat bending, cold lamination, or any other suitable technique, andmay end up with a curvature radius after bending of from about 0.05 to100 nm. Low resolution touch panels on glass allow the user to selectinformation or otherwise interact with the glass surface whilesimultaneously viewing what's behind the glass. In a standaloneconfiguration, for example, the touch panel may be operated from bothsides of the glass panel. Low resolution capacitive touch panels may befor example an array of 5×5 touch buttons, each about a square inch andseparated by about half an inch, as shown in FIG. 9. The touch principleof operation may be self-capacitance which can detect gloved fingers aswell as bare fingers. The interconnect flex circuit in FIG. 9 isconnected to a touch controller and the function of each button cantherefore be reconfigured in software or firmware. The lower resolutiontouch interface is easier to make than a multi-touch panel on top of ahigh resolution LCD, because the minimum feature size for the patterningcoating 41 by laser, photolithography or other method can be muchlarger. For example, the minimum feature size for the traces could beabout 1 mm, so that the requirements for pinholes, scratches and otherdefects in the glass and in the coating are greatly relaxed. In otherwords, it allows the use of standard soda lime glass 40 and coatings 41produced in a horizontal architectural coater. For certain lowresolution touch applications, there is no need for the advanced cleanroom facilities that typically are used to produce high resolutionmulti-touch panels for phones, tablets, laptops and larger sizemulti-touch panels. The wider traces (e.g 1 mm) also reduce theresistance and signal delay from the touch electrodes.

Referring to the laminated FIG. 10 embodiment (the coatings of any ofFIGS. 2-8 may be used in the FIG. 10 embodiment, as well as in the FIG.7 lamination embodiment), to further protect the patterned silver basedcoating 41 from corrosion in a standalone application, the touch panelsubstrate 40 (with or without an AR coating thereon between 40 and 41)is laminated to another glass substrate 45 with PVB, EVA, or otherpolymer inclusive lamination material 52. The PVB 52 based laminatinglayer for example will encapsulate the patterned coating 41, so thatcorrosion is further inhibited. Of course, as explained herein, thetouch panel need not include the second substrates or the laminatinglayer in certain instances and may be made up of the glass substrate 40and the electrodes/traces/circuitry discussed herein.

FIGS. 15-17 are cross sectional views of capacitive touch panelsaccording to various embodiments of this invention that includeadditional functional film 300. FIG. 15 is a cross sectional view of acapacitive touch panel according to an example embodiment of thisinvention, including the transparent conductive coating pattern 41according to any of FIGS. 2, 3, 4 (any of 4(a)-(g)), 7, 8, 9, or 10 onsurface #2, and an additional functional film 300 provided on thesurface adapted to be touched by a user. Note the user's finger shown inFIG. 15. Meanwhile, FIG. 16 is a cross sectional view of a capacitivetouch panel according to another example embodiment of this invention,including the transparent conductive coating pattern 41 according to anyof FIG. 2, 3, 4, 7, 8, 9, or 10 on surface #3, and an additionalfunctional film 300 provided on the surface adapted to be touched by auser. In the laminated embodiments of FIGS. 15-16, to further protectthe patterned silver based coating 41 from corrosion, the touch panelsubstrate 40 (glass or plastic, with or without an AR coating thereonbetween 40 and 41) is laminated to another glass substrate 45 (or 200)with PVB or other polymer inclusive lamination material 52. Thelaminating material (e.g., EVA or PVB) 52 will encapsulate the patternedcoating 41, so that corrosion is further inhibited. And FIG. 17 is across sectional view of a monolithic capacitive touch panel according toanother example embodiment of this invention, including the transparentconductive coating pattern 41 according to any of FIG. 2, 3, 4, 7, 8, 9,or 10 on surface #2, and additional functional films 300 and 301. TheFIG. 17 monolithic embodiment may be designed for the user to toucheither major surface of the touch panel. An interconnect 400, such as aflexible circuit, is provided for allowing the electrodes 41 of thetouch panel to communicate with processing circuitry such as theprocessor discussed above.

Functional film 300 and/or 301 in FIGS. 15-17 may be made up of one ormore layers, and may be one or more of: an index-matching film, anantiglare film, an anti-fingerprint film, and anti-microbial film, ascratch resistant film, and/or an antireflective (AR) film. Unlike theelectrode/trace coating 41, functional films 300 and 301 need not bepatterned and may be applied across substantially the entirety of thesubstrate 40 (or 45).

When functional film 300 and/or 301 is an index matching (see also indexmatching film 85 in FIG. 7), this is provided to reduce the refractiveindex different between the areas/surfaces adjacent the two sides of theindex matching film, in order to reduce visible reflections and renderthe touch panel more aesthetically pleasing. Laminating layers 52 inFIGS. 15-16 may also be index matching films. Index matching films mayor may not be adhesive types in different embodiments of this invention.Thus, the index matching film has a refractive index value that isvalued between the respective refractive index values of theareas/surfaces on both sides of the index matching film. For example, inFIG. 7 the index matching film 85 has a refractive index value betweenthe refractive index values of coating 41 and substrate 200. In asimilar manner, in FIG. 15 the index matching film 300 would have arefractive index value between the refractive index values of substrate40 and air. In a similar manner, in FIG. 17 the index matching film 301would have a refractive index value between the refractive index valuesof coating 41 and air. Example index matching films include opticallyclear adhesives and index matching laminating material.

When functional film 300 in FIGS. 15-17 is an antiglare film, this isprovided to reduce glare off the front of the touch panel in order torender the touch panel more aesthetically pleasing. Example anti-glarefilms that may be used are described in U.S. Pat. Nos. 8,114,472 and8,974,066, which are incorporated herein by reference. Moreover, anantiglare surface at surface #1 of the touch panel may be obtained by ashort or weak acid etch of surface #1 (the surface shown being touchedin FIGS. 15-17).

When functional film 300 in FIGS. 15-17 is an anti-fingerprint film,this is provided to reduce visibility of fingerprints on the touch panelto render the touch panel more aesthetically pleasing. Exampleanti-fingerprint films that may be used are described in U.S. Pat. No.8,968,831, which is incorporated herein by reference. Anti-fingerprintor anti-smudge films may be obtained for example with an oleo-phobiccoating and/or roughened surface. Spray-on anti-fingerprint coatings,such as fluorocarbon compounds, with limited durability, may also beused. Such film may increase the initial contact angle of surface #1(for sessile drop of water) of the touch panel to a value of at least 90degrees, more preferably at least 100 degrees, and most preferably atleast 110 degrees.

When functional film 300 in FIGS. 15-17 is an anti-microbial film, thisis provided to kill germs at the front of the touch panel in order torender the touch panel more health appealing. Example anti-microbialfilms that may be used include silver colloids, rough titanium oxide,porous titanium oxide, doped titanium oxide, and may be described inU.S. Pat. Nos. 8,647,652, 8,545,899, 7,846,866, 8,802,589, 2010/0062032,7,892,662, 8,092,912, and 8,221,833, which are all incorporated hereinby reference.

When functional film 300 in FIGS. 15-17 is a scratch resistant film,this is provided to reduce scratching and improve durability of thetouch panel. Example scratch resistant films may be made of ZrO₂ or DLC.When functional film 300 is of or includes DLC, the DLC may for examplebe any of the DLC materials discussed in any of U.S. Pat. Nos.6,261,693, 6,303,225, 6,447,891, 7,622,161, and/or 8,277,946, which areincorporated herein by reference.

When functional film 300 in FIGS. 15-17 is an antireflective (AR) film,this is provided to reduce visible reflections off the front of thetouch panel to render the panel more aesthetically pleasing. Example ARfilms that may be used are described in U.S. Pat. Nos. 9,556,066,9,109,121, 8,693,097, 7,767,253, 6,337,124, and 5,891,556, thedisclosures of which are hereby incorporated herein by reference. Incertain example embodiments, the AR film may be part of the multi-layertransparent conductive coating (e.g., see AR film 70 which is part ofcoating 41′ in FIG. 4(c)).

It is noted that in various embodiments of this invention, electrodepatterns other than a rectangular array of buttons can be envisionedincluding patterns allowing swiping, circular patterns for dials, and soforth. Potential applications include storefronts, commercialrefrigerators, appliances, glass walls in office or other environments,transportation, dynamic glazing, vending machines, and so forth, where asee-through low resolution touch panel is beneficial as a userinterface. A silver-based coating 41 has up to 10× lower sheetresistance than ITO at about 4× lower cost and will therefore be morecost-effective.

The sputter-deposited coating 41 discussed above in connection withFIGS. 2-10 may be formed and patterned in any of a variety of manners.For example, the sputter-deposited coating 41 may be formed by inkjetprinting and lift-off (see FIG. 11), metal shadow mask patterning (seeFIG. 12), photolithograph (see FIG. 13), or laser patterning (see FIG.14).

In an example embodiment of this invention, there is provided acapacitive touch panel comprising: a glass substrate; a multi-layertransparent conductive coating supported by the glass substrate, themulti-layer transparent conductive coating including at least oneconductive layer comprising silver, a dielectric layer comprising zincoxide under and directly contacting the conductive layer comprisingsilver, and a dielectric layer comprising zirconium oxide and/or siliconnitride over the conductive layer comprising silver; a plurality ofelectrodes and a plurality of conductive traces, wherein the electrodesand/or the conductive traces include the multi-layer transparentconductive coating; a processor for detecting touch position on thetouch panel; wherein the electrodes are formed substantially in a commonplane substantially parallel to the glass substrate; and a plurality ofthe electrodes are electrically connected to the processor by conductivetraces.

In the capacitive touch panel of the immediately preceding paragraph,the transparent conductive coating may comprise, moving away from theglass substrate: a first dielectric layer comprising silicon nitride;the dielectric layer comprising zinc oxide; the conductive layercomprising silver; a layer over and contacting the conductive layercomprising silver; another dielectric layer; and the dielectric layercomprising zirconium oxide and/or silicon nitride.

In the capacitive touch panel of any of the preceding two paragraphs,the layer over and contacting the conductive layer comprising silver maycomprise Ni and/or Cr.

In the capacitive touch panel of any of the preceding three paragraphs,the transparent conductive coating may have a sheet resistance of lessthan or equal to about 15 ohms/square, more preferably less than orequal to about 10 ohms/square.

In the capacitive touch panel of any of the preceding four paragraphs,the dielectric layer comprising zirconium oxide and/or silicon nitridemay comprises ZrO₂.

For the capacitive touch panel of any of the preceding five paragraphs,the touch panel may be provided on a glass door such as a shower door.

In the capacitive touch panel of any of the preceding six paragraphs,the touch panel may be configured to control a shower functionality.

In the capacitive touch panel of any of the preceding seven paragraphs,the glass substrate may be thermally tempered.

In the capacitive touch panel of any of the preceding eight paragraphs,the glass substrate may further support a functional film. Thefunctional film may be on either, or both, sides of the glass substrate.The functional film may be one or more of an index-matching film, anantiglare film, an anti-fingerprint film, and anti-microbial film, ascratch resistant film, and/or an antireflective (AR) film.

In the capacitive touch panel of any of the preceding nine paragraphs,the touch panel, including the electrodes and traces, may have a visibletransmission of at least 70%.

The capacitive touch panel of any of the preceding ten paragraphs mayfurther comprise a laminating layer (e.g., PVB or EVA) and another glasssubstrate, wherein the laminating layer and the multi-layer transparentconductive coating may be provided between the glass substrates.

The forgoing exemplary embodiments are intended to provide anunderstanding of the disclosure to one of ordinary skill in the art. Theforgoing description is not intended to limit the inventive conceptdescribed in this application, the scope of which is defined in thefollowing claims.

1-25. (canceled)
 26. A capacitive touch panel, comprising: a substrate;a patterned multi-layer transparent conductive coating supported by thesubstrate, the patterned multi-layer transparent conductive coatingincluding a first dielectric layer comprising silicon nitride, atransparent conductive layer comprising NiCr, and a second dielectriclayer comprising zirconium oxide and/or silicon nitride over at leastthe conductive layer, wherein the conductive layer is located between atleast the first and second dielectric layers, and wherein the firstconductive layer is located between at least the substrate and theconductive layer; each of said layers of the patterned multi-layertransparent conductive coating being patterned in the same shape, intoat least one electrode; the at least one electrode comprising themulti-layer transparent conductive coating; and a processor fordetecting touch position on the touch panel via the at least oneelectrode.
 27. The capacitive touch panel of claim 26, wherein thetransparent conductive coating has a sheet resistance of less than orequal to about 15 ohms/square.
 28. The capacitive touch panel of claim26, wherein the substrate is a glass substrate that is thermallytempered.
 29. The capacitive touch panel of claim 26, wherein thesubstrate further supports a functional film.
 30. The capacitive touchpanel of claim 29, wherein the functional film is an index-matchingfilm.
 31. The capacitive touch panel of claim 29, wherein the functionalfilm is an antiglare film, and is located on an opposite side of thesubstrate than the transparent conductive coating.
 32. The capacitivetouch panel of claim 29, wherein the functional film is ananti-fingerprint film, and is located on an opposite side of thesubstrate than the transparent conductive coating.
 33. An assemblycomprising the capacitive touch panel of claim 26, coupled to a displaypanel.
 34. The capacitive touch panel of claim 26, further comprising alaminating layer and another substrate, wherein the laminating layer andthe multi-layer transparent conductive coating are provided between thesubstrates.
 35. The capacitive touch panel of claim 34, wherein thelaminating layer comprises PVB.
 36. The capacitive touch panel of claim26, wherein the touch panel has a visible transmission of at least 70%.